Workbench position measuring system

一种工作台位置测量系统

Abstract

本发明提供了一种工作台位置测量系统包括:镜头、主基板、承片台、大理石、至少一光栅尺组、以及与该光栅尺组相对应的至少一读头组,该镜头固定在主基板上,读头组合成一读头集,且该读头集安装在主基板上,光栅尺组固定在承片台的四周,承片台安装在大理石上并在大理石表面运动,读头组通过读头组与光栅尺组的相对运动读取运动信息,通过镜头采集该读头集的读数,得到该承片台在大理石表面的运动信息。该工作台位置测量系统,可稳定有效而且高精度的测量工作台的运动,工作台位置测量系统集成度较高,相对独立和完整,受其他分系统维修维护的影响较小。
The invention provides a workbench position measuring system. The workbench position measuring system comprises a lens, a main base plate, a wafer supporting stage, a marble, one or more grating ruler groups and one or more read head groups corresponding to the one or more grating ruler groups. The lens is fixed on the main base plate. The one or more read head groups form a read head set. The read head set is installed on the main base plate. The one or more grating ruler groups are fixed around the wafer supporting stage. The wafer supporting stage is installed on the marble and moves on the surface of the marble. The one or more read head groups can read motion information through relative motion between the one or more read head groups and the one or more grating ruler groups. Readings of the read head set is collected through the lens so that motion information of the wafer supporting stage on the surface of the marble is obtained. The workbench position measuring system can stably, effectively and accurately measure workbench motion. The workbench position measuring system has a high integrated level, is relatively independent and complete, and is subjected to a small influence from maintenance of other subsystems.

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