Lithographic device

光刻设备

Abstract

一种光刻设备,包括:反应腔;位于反应腔内,用于在其上形成光掩膜层的卡盘;设置在反应腔内用于固定卡盘的固定盘,连接固定盘和卡盘并用于支撑卡盘的支撑柱,还包括:连接至固定盘,具有多个喷嘴的清洗装置。所述的光刻设备在反应腔内设置了清洗装置,在反应腔内产生污染物粒子之后,可以通过所述清洗装置清洗所述反应腔,避免了采用人工清洗造成的人力浪费,并且避免对人体产生伤害。
The invention discloses a lithographic device, comprising a reaction chamber, a chuck which is arranged in the reaction chamber and used for forming a photomask layer on the chuck, a fixed plate which is arranged in the reaction chamber and used for fixing the chuck, a support column which is connected with the fixed plate and the chuck and used for supporting the chuck, and a cleaning unit which has a plurality of nozzles and is connected with the fixed plate. By arranging the cleaning unit in the reaction chamber, when pollutant particles generate in the reaction chamber, the cleaning unit can be used for cleaning the reaction chamber, so that labor power waste caused by using manual cleaning is avoided, and the damage to the human body is prevented.

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Cited By (1)

    Publication numberPublication dateAssigneeTitle
    CN-104049469-ASeptember 17, 2014台湾积体电路制造股份有限公司Lithography System with an Embedded Cleaning Module